SLEEVE WIPER:

Clean lamp sleeves are necessary to provide proper transmission of UV light. This photo shows an example of a sleeve wiper.

Trojan sleeve wiping system

Sleeves can become fouled by build-up of organic and inorganic debris such as calcium scale, silt, or iron on the sleeve reducing UV transmittance (Jesky et al., 2001).

Cleaning Systems:

Off-line chemical cleaning (OCC)
The reactor is taken off-line. Water is drained from the reactor, and cleaning solution is sprayed into the reactor at high pressure. After cleaning, the solution is removed from the reactor and the reactor is put back into service. Typical cleaning solutions include citric acid, phosphoric acid, or a manufacturer provided solution. This method is typically used for LP and LPHO systems.

On-line mechanical cleaning (OMC)
The OMC method uses wipers to clean the lamp sleeve while the reactor is on-line. The wipers are moved by electric motors or pneumatic pistons. Two different wipers are used for cleaning the lamp sleeves. Mechanical wipers move along the sleeve and clean it with stainless steel brush collars or O-rings. Physical-chemical wipers clean the sleeve in two ways. The wiper removes fouling on the sleeve physically, while cleaning solution inside the collar chemically dissolves fouling on the sleeve. OMC is typically used for MP systems.