SLEEVE WIPER:
Clean lamp sleeves are necessary to provide proper transmission of
UV light. This photo shows an example of a sleeve wiper.
Trojan
sleeve wiping system
Sleeves can become fouled by build-up of organic and inorganic debris
such as calcium scale, silt, or iron on the sleeve reducing UV transmittance
(Jesky et al., 2001).
Cleaning Systems:
Off-line chemical cleaning (OCC)
The reactor is taken off-line. Water is drained from the reactor, and
cleaning solution is sprayed into the reactor at high pressure. After
cleaning, the solution is removed from the reactor and the reactor is
put back into service. Typical cleaning solutions include citric acid,
phosphoric acid, or a manufacturer provided solution. This method is
typically used for LP and LPHO systems.
On-line mechanical cleaning (OMC)
The OMC method uses wipers to clean the lamp sleeve while the reactor
is on-line. The wipers are moved by electric motors or pneumatic pistons.
Two different wipers are used for cleaning the lamp sleeves. Mechanical
wipers move along the sleeve and clean it with stainless steel brush
collars or O-rings. Physical-chemical wipers clean the sleeve in two
ways. The wiper removes fouling on the sleeve physically, while cleaning
solution inside the collar chemically dissolves fouling on the sleeve.
OMC is typically used for MP systems.
|